An objectively
and continuously process control of low-pressure plasma deposition techniques, such as PVD
(Physical Vapor Deposition), is one of the real issues today. Aside
from a visual examination of the plasma's light emission, sometimes the mass spectroscopy
technique is used. Especially the mass spectroscopy is neither handy to operate nor the
results are easy to interpret. Compared with this, the benefits of using the OES (Optical
Emission Spectroscopy) and our fiber optics coupled
TranSpec Spectrometers are obvious:
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Technology Features |
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Simultaneous measurement
in the spectral range ~ 200...1000 nm |
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Detection of even very low emission
intensities |
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Connectable to almost every vacuum chamber |
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Maintenance-free technology |
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Comfortable and easy-to-use software PEM-ProVis
Professional
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Application Note |
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Schematic Gauge Setup |
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The plasma emission is
captured inside the chamber through a special, flexible vacuum fiber optics
cable, which is connected by a flange with another fiber light guide outside
the chamber.
Note that, due to the use of these flexible vacuum fiber optics, the light emission can be
observed also at different positions in front of the plasma! |
Schematic gauge setup
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The picture right
beside shows a vacuum fiber feed-thru with a KF-50 flange and two FSMA adapters in order
to connect a vacuum fiber inside the chamber and a regular fiber outside
the chamber, which goes towards the TranSpec spectrometer. |
KF-50 flange with FSMA / FSMA adapter
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